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arXiv 1002.4059math.AP
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一个光刻反问题的分析

Analysis of an Inverse Problem Arising in Photolithography

Luca Rondi, Fadil Santosa

摘要:

我们考虑在光刻中确定产生所需电路图案的光学掩模的逆问题。我们把问题的形状设计问题,其中未知是一个二维域。目标形状和未知量之间的关系通过衍射光学建模。我们开发了一个变分公式,是适定的,并提出了一个近似,可以证明具有收敛性。该近似问题可以作为数值方法的基础。

英文摘要:

We consider the inverse problem of determining an optical mask that produces a desired circuit pattern in photolithography. We set the problem as a shape design problem in which the unknown is a two-dimensional domain. The relationship between the target shape and the unknown is modeled through diffractive optics. We develop a variational formulation that is well-posed and propose an approximation that can be shown to have convergence properties. The approximate problem can serve as a foundation to numerical methods.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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