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arXiv 1002.1778cond-mat.mes-hallcond-mat.mtrl-sci
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多层石墨烯结构中的电诱导n-i-p结

Electrically-induced n-i-p junctions in multiple graphene layer structures

M. Ryzhii, V. Ryzhii, T. Otsuji, V. Mitin, M. S. Shur

摘要:

采用简化的解析模型和数值计算方法,计算了多层石墨烯结构中电诱导n-i-p结的n区和p区中不同石墨烯层(GL)中电子和空穴的费米能级及其密度.反向偏置下的少数载流子注入的n-和p-区的电感应n-i-p结的反向电流进行了计算。结果表明,在具有中等数量的GLs的电感应n-i-p结中,反向电流可以被基本上抑制。因此,具有这种n-i-p结的多GL结构可以用于不同的电子和光电子器件。

英文摘要:

The Fermi energies of electrons and holes and their densities in different graphene layers (GLs) in the n- and p-regions of the electrically induced n-i-p junctions formed in multiple-GL structures are calculated both numerically and using a simplified analytical model. The reverse current associated with the injection of minority carriers through the n- and p-regions in the electrically-induced n-i-p junctions under the reverse bias is calculated as well. It is shown that in the electrically-induced n-i-p junctions with moderate numbers of GLs the reverse current can be substantially suppressed. Hence, multiple-GL structures with such n-i-p junctions can be used in different electron and optoelectron devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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