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arXiv 0906.3748cond-mat.mes-hall
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具有可调横向几何形状的增强型双顶栅MOS纳米结构

Enhancement mode double top gated MOS nanostructures with tunable lateral geometry

E. P. Nordberg, G. A. Ten Eyck, H. L. Stalford, R. P. Muller, R. W. Young, K. Eng, L. A. Tracy, K. D. Childs, J. R. Wendt, R. K. Grubbs, J. Stevens, M. P. Lilly… 展开作者

E. P. Nordberg, G. A. Ten Eyck, H. L. Stalford, R. P. Muller, R. W. Young, K. Eng, L. A. Tracy, K. D. Childs, J. R. Wendt, R. K. Grubbs, J. Stevens, M. P. Lilly, M. A. Eriksson, M. S. Carroll

摘要:

我们目前的测量硅(Si)的金属氧化物半导体(MOS)的纳米结构,使用的过程中,促进基本上任意的栅极几何形状。在几个具有开放横向量子点几何形状的MOS量子点中,表现出稳定的库仑阻塞行为,不受寄生点形成的影响。在迁移率和电荷缺陷密度(即界面陷阱和固定的氧化物电荷)的增加的减少测量的关键工艺步骤,我们与低无序行为的定量缺陷密度。这项工作提供了定量的指导,以前没有建立有关的缺陷密度,硅量子点不表现出寄生点的形成。这些器件利用双层栅堆叠,其中包括关键栅氧化层在内的许多区域都是在完全合格的CMOS设施中制造的。

英文摘要:

We present measurements of silicon (Si) metal-oxide-semiconductor (MOS) nanostructures that are fabricated using a process that facilitates essentially arbitrary gate geometries. Stable Coulomb blockade behavior free from the effects of parasitic dot formation is exhibited in several MOS quantum dots with an open lateral quantum dot geometry. Decreases in mobility and increases in charge defect densities (i.e. interface traps and fixed oxide charge) are measured for critical process steps, and we correlate low disorder behavior with a quantitative defect density. This work provides quantitative guidance that has not been previously established about defect densities for which Si quantum dots do not exhibit parasitic dot formation. These devices make use of a double-layer gate stack in which many regions, including the critical gate oxide, were fabricated in a fully-qualified CMOS facility.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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