arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 0902.1438cond-mat.mtrl-sci
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快速热退火制备的全Heusler Co2FeSi合金薄膜中L21-ordering的分析

Analysis of L21-ordering in full-Heusler Co2FeSi alloy thin films formed by rapid thermal annealing

Yota Takamura, Ryosho Nakane, Satoshi Sugahara

摘要:

作者发展了一种新的评价全Heusler合金中原子有序性的分析方法,它是常用Webster模型的扩展。我们的模型可以给出L21结构中原子有序度的精确物理形式,包括相对于完全无序的A2结构的校正,即,该模型可以直接评价比完全B2-序结构更低序结构下的L21-序程度。将该模型应用于快速热退火制备的全Heusler Co2 FeSi合金薄膜。在TA = 800 ℃下形成的膜在97%的高B2-有序度下显示出83%的相对高的L21-有序度。

英文摘要:

The authors developed a new analysis approach for evaluation of atomic ordering in full-Heusler alloys, which is extension of the commonly used Webster model. Our model can give accurate physical formalism for the degree of atomic ordering in the L21 structure, including correction with respect to the fully disordered A2 structure, i.e., the model can directly evaluate the degree of L21-ordering under a lower ordering structure than the complete B2-ordering structure. The proposed model was applied to full-Heusler Co2FeSi alloy thin films formed by rapid thermal annealing. The film formed at TA = 800 C showed a relatively high degree of L21-ordering of 83 % under a high degree of B2-ordering of 97 %.

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