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arXiv 0902.0875cond-mat.mtrl-sci
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PDIF-CN2单晶晶体管在真空和环境中的高电子迁移率

High Electron Mobility in Vacuum and Ambient for PDIF-CN2 Single-Crystal Transistors

Anna S. Molinari, Helena Alves, Zhihua Chen, Antonio Facchetti, Alberto F. Morpurgo

摘要:

我们研究了基于PDIF-CN $_{2}$单晶的场效应晶体管的电子迁移率。小分子PDI 8-CN $_{2}$家族已被选择用于气相沉积薄膜FET获得的有希望的结果。我们使用一层PMMA(旋涂在SiO $_{2}$的顶部)作为栅极电介质,以降低氧化物表面存在的羟基捕获电子的可能性。对于这些器件,我们在真空中获得了6 cm $^{2}$ /Vs的室温迁移率,在空气中获得了3 cm $^{2}$ /Vs的室温迁移率。我们的测量结果表明,有可能获得与p型器件的性能相当的n型OFFERS。

英文摘要:

We have investigated the electron mobility on field-effect transistors based on PDIF-CN$_{2}$ single crystals. The family of the small molecules PDI8-CN$_{2}$ has been chosen for the promising results obtained for vapour-deposited thin film FETs. We used as gate dielectric a layer of PMMA (spinned on top of the SiO$_{2}$), to reduce the possibility of electron trapping by hydroxyl groups present at surface of the oxide. For these devices we obtained a room temperature mobility of 6 cm$^{2}$/Vs in vacuum and 3 cm$^{2}$/Vs in air. Our measurements demonstrate the possibility to obtain n-type OFETs with performances comparable to those of p-type devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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