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arXiv 0810.2835cond-mat.mtrl-sci
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具有高质量异质界面的外延铁磁Fe $_{3}$ Si/Si(111)结构

Epitaxial ferromagnetic Fe$_{3}$Si/Si(111) structures with high-quality hetero-interfaces

K. Hamaya, K. Ueda, Y. Kishi, Y. Ando, T. Sadoh, M. Miyao

摘要:

为了开发硅基自旋电子器件,我们探索了高质量铁磁Fe $_{3}$ Si/Si(Si)结构。采用低温分子束外延技术,在130 $^circ$ C下,在Si(111)衬底上外延生长了铁磁Fe $_{3}$ Si层,并保持了突变界面,生长的Fe $_{3}$ Si层具有有序的$DO_{3}$相。对Fe $_{3}$ Si/Si(111)的磁性和电学性质的测量产生约3.16 $mu_{B}$ /f. u的磁矩。和整流肖特基二极管的行为与理想的因素~ 1.08,分别。

英文摘要:

To develop silicon-based spintronic devices, we have explored high-quality ferromagnetic Fe$_{3}$Si/silicon (Si) structures. Using low-temperature molecular beam epitaxy at 130 $^circ$C, we realize epitaxial growth of ferromagnetic Fe$_{3}$Si layers on Si (111) with keeping an abrupt interface, and the grown Fe$_{3}$Si layer has the ordered $DO_{3}$ phase. Measurements of magnetic and electrical properties for the Fe$_{3}$Si/Si(111) yield a magnetic moment of ~ 3.16 $mu_{B}$/f.u. at room temperature and a rectifying Schottky-diode behavior with the ideality factor of ~ 1.08, respectively.

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