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arXiv 0809.2177physics.plasm-ph
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Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2

D. A. Ariskin, I. V. Schweigert, A. L. Alexandrov, A. Bogaerts, F. M. Peeters

英文摘要:

We study the properties of a capacitive 13.56 MHz discharge properties with a mixture of Ar/C2H2 taking into account the plasmochemistry and growth of heavy hydrocarbons. A hybrid model was developed to combine the kinetic description for electron motion and the fluid approach for negative and positive ions transport and plasmochemical processes. A significant change of plasma parameters related to injection of 5.8% portion of acetylene in argon was observed and analyzed. We found that the electronegativity of the mixture is about 30%. The densities of negatively and positively charged heavy hydrocarbons are sufficiently large to be precursors for the formation of nanoparticles in the discharge volume.

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