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arXiv 0808.4145cond-mat.mes-hall
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方量子阱中朗道能级填充因子$ν= 1/2$附近复合费米子态的电阻涨落

Resistance Fluctuations in Composite Fermion State near Landau Level Filling Factor $ν= 1/2$ in A Square Quantum Well

Jian Zhang, R. R. Du, J. A. Simmons, J. L. Reno

摘要:

研究了GaAs-Al_(0. 3)Ga_(0. 7)As方阱(宽35 nm)在磁场高达42 T和温度50 ~ 1.5 K范围内朗道能级填充因子$ν= 1/2$附近的磁输运。在T < 200 mK的低温下,Rxx表现出一个深的、强烈依赖于温度的最小值,中心位于$ν= 1/2$。伴随的Rxy与磁场(B)不是严格线性的,并且Rxy相对于B的一阶导数在$ν= 1/2$处示出尖锐的尖点,指示非经典的霍尔效应。我们验证这些特性是单层起源通过施加平面内磁场或静电门。该数据可以用信号表示复合费米子状态中对量子阱中的$ν= 1/2$配对的挫折,其中电子层厚度远远超过磁性长度。

英文摘要:

We have studied the magnetotransport near Landau level filling factor $ν= 1/2$ in a GaAs-Al0.3Ga0.7As square quantum well (width 35 nm) in magnetic field up to 42 T and in a temperature range between 50 mK and 1.5 K. In low temperatures T < 200 mK, the Rxx exhibits a deep, strongly temperature-dependent minimum centered at $ν= 1/2$. The concomitant Rxy is not strictly linear with magnetic field (B) and the first derivative of Rxy with respect to B shows a sharp cusp at $ν= 1/2$, indicating a non-classical Hall effect. We verify these characteristics are being single-layer origin by applying an in-plane magnetic field or electrostatic gates. The data may signal frustrations in the composite fermion state towards $ν= 1/2$ pairing in the quantum well where the electron layer thickness far exceeds the magnetic length.

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