arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 0804.4360cond-mat.mtrl-sci
收藏

纳米尺度下晶格对位错运动的阻力

Lattice Resistance to Dislocation Motion at the Nanoscale

A. Dutta, M. Bhattacharya, P. Barat, P. Mukherjee, N. Gayathri, G. C. Das

摘要:

在这封信中,我们提出了一个模型,演示了在纳米系统中的移动位错所经历的晶格电阻的自由表面的效果。这种效应表现在由于位错线接近表面而提高的位错速度。为了验证这一发现,分子动力学模拟的bcc钼刃型位错进行,结果被发现是与该模型的数值实现。在较高的应力和温度下,这种效果的减少,如模拟所揭示的,证实了晶格电阻背后观察到的位错速度的变化的作用。

英文摘要:

In this letter we propose a model that demonstrates the effect of free surface on the lattice resistance experienced by a moving dislocation in nanodimensional systems. This effect manifests in an enhanced velocity of dislocation due to the proximity of the dislocation line to the surface. To verify this finding, molecular dynamics simulations for an edge dislocation in bcc molybdenum are performed and the results are found to be in agreement with the numerical implementations of this model. The reduction in this effect at higher stresses and temperatures, as revealed by the simulations, confirms the role of lattice resistance behind the observed change in the dislocation velocity.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑