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arXiv 0804.0670cond-mat.mtrl-scicond-mat.other
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电沉积Ni/Cu膜界面形貌的中子漫反射率和AFM研究

Diffuse neutron reflectivity and AFM study of interface morphology of an electro-deposited Ni/Cu film

Surendra Singh, Saibal Basu, S. K. Ghosh

摘要:

采用离面中子反射技术和原子力显微镜对电沉积Ni/Cu双层膜的界面形貌进行了详细的研究。在Ti/Cu的种子层上电沉积Ni/Cu双层膜。这两个种子层通过磁控溅射沉积。由镜面中子反射率数据得到了样品中密度的深度分布。AFM图像的空气膜界面显示,表面覆盖着不同大小的球状岛屿。表面的AFM高度分布清楚地显示出两个峰[图3],并且膜中表面上的浮雕结构(岛)可以被视为准两级随机粗糙表面结构。我们已经证明,空气膜界面的详细形态,准两个层次的表面结构,以及埋界面的形态,可以从非镜面中子反射率数据。我们已经表明,从原子力显微镜和离镜中子反射率数据的电沉积表面的形貌是明显不同的,在这个样品中的光刻沉积界面。据我们所知,这是第一次尝试在微观上量化两种不同的技术,即电沉积和溅射沉积的金属界面的形态差异。

英文摘要:

We present a detailed study of the interface morphology of an electro-deposited (ED) Ni/Cu bilayer film by using off-specular (diffuse) neutron reflectivity technique and Atomic Force Microscopy (AFM). The Ni/Cu bilayer has been electro-deposited on seed layers of Ti/Cu. These two seed layers were deposited by magnetron sputtering. The depth profile of density in the sample has been obtained from specular neutron reflectivity data. AFM image of the air-film interface shows that the surface is covered by globular islands of different sizes. The AFM height distribution of the surface clearly shows two peaks [Fig. 3] and the relief structure (islands) on the surface in the film can be treated as a quasi-two-level random rough surface structure. We have demonstrated that the detailed morphology of air-film interfaces, the quasi-two level surface structure as well as morphology of the buried interfaces can be obtained from off-specular neutron reflectivity data. We have shown from AFM and off-specular neutron reflectivity data that the morphologies of electro-deposited surface is distinctly different from that of sputter-deposited interface in this sample. To the best of our knowledge this is the first attempt to microscopically quantify the differences in morphologies of metallic interfaces deposited by two different techniques viz. electro-deposition and sputtering.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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