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arXiv 0802.2080cond-mat.mtrl-sci
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(Ga,Mn)As中的增强退火、高居里温度和低电压门控:表面氧化物控制研究

Enhanced annealing, high Curie temperature and low-voltage gating in (Ga,Mn)As: A surface oxide control study

K. Olejnik, M. H. S. Owen, V. Novak, J. Masek, A. C. Irvine, J. Wunderlich, T. Jungwirth

摘要:

(Ga As和相关的稀磁半导体在自旋电子学研究中发挥着重要作用,因为它们具有将铁磁性和半导体性质结合在一个物理系统中的潜力。铁磁性需要约1-10%的替代Mn_Ga。在这些高掺杂下生长期间形成的无意缺陷显著抑制居里温度。我们目前的实验中,通过蚀刻的(Ga,Mn)As表面氧化物,我们实现了显着减少退火时间所需的优化生长后的铁磁膜,并报告居里温度为180 K在约8%的Mn_Ga。我们的研究阐明了控制去除最有害的,间隙锰缺陷的机制。高度掺杂的(Ga,Mn)As半导体的电选通的限制和效用尚未建立;到目前为止,已经证明了在顶栅场效应晶体管结构上施加数十伏的电场对磁化的影响。在本文的第二部分中,我们提出了一个背栅,n-GaAs/AlAs/GaMnAs晶体管工作在几伏。受(Ga,Mn)As薄膜腐蚀研究的启发,我们采用氧化腐蚀/再氧化工艺来减小(Ga,Mn)As薄膜的厚度(载流子的平均密度),并观察到选通效率的大幅度提高。我们报告了一系列各向异性磁电阻测量的门控自旋电子学特性。

英文摘要:

(Ga,Mn)As and related diluted magnetic semiconductors play a major role in spintronics research because of their potential to combine ferromagnetism and semiconducting properties in one physical system. Ferromagnetism requires ~1-10% of substitutional Mn_Ga. Unintentional defects formed during growth at these high dopings significantly suppress the Curie temperature. We present experiments in which by etching the (Ga,Mn)As surface oxide we achieve a dramatic reduction of annealing times necessary to optimize the ferromagnetic film after growth, and report Curie temperature of 180 K at approximately 8% of Mn_Ga. Our study elucidates the mechanism controlling the removal of the most detrimental, interstitial Mn defect. The limits and utility of electrical gating of the highly-doped (Ga,Mn)As semiconductor are not yet established; so far electric-field effects have been demonstrated on magnetization with tens of Volts applied on a top-gate, field effect transistor structure. In the second part of the paper we present a back-gate, n-GaAs/AlAs/GaMnAs transistor operating at a few Volts. Inspired by the etching study of (Ga,Mn)As films we apply the oxide-etching/re-oxidation procedure to reduce the thickness (arial density of carriers) of the (Ga,Mn)As and observe a large enhancement of the gating efficiency. We report gatable spintronic characteristics on a series of anisotropic magnetoresistance measurements.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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