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arXiv 0808.1464cond-mat.mtrl-sci
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(Ga,Mn)As的高居里温度

Achieving High Curie Temperature in (Ga,Mn)As

M Wang, R P Campion, A W Rushforth, K W Edmonds, C T Foxon, B L Gallagher

摘要:

研究了生长温度、Ga:As比和生长后退火工艺对分子束外延(Ga,Mn)As层居里温度Tc的影响。我们实现了最高的Tc值的生长温度非常接近的2D-3D相边界。由于通过生长后退火去除间隙Mn而导致的Tc的增加被第二过程抵消,该第二过程降低Tc并且在更高的退火温度下更有效。我们的研究结果表明,这是必要的,以获得最高的Tc的生长参数和生长后的退火程序。

英文摘要:

We study the effects of growth temperature, Ga:As ratio and post-growth annealing procedure on the Curie temperature, Tc, of (Ga,Mn)As layers grown by molecular beam epitaxy. We achieve the highest Tc values for growth temperatures very close to the 2D-3D phase boundary. The increase in Tc, due to the removal of interstitial Mn by post growth annealing, is counteracted by a second process which reduces Tc and which is more effective at higher annealing temperatures. Our results show that it is necessary to optimize the growth parameters and post growth annealing procedure to obtain the highest Tc.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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