离子束溅射自组织表面纳米图案化
Self-organized surface nanopatterning by ion beam sputtering
摘要：
在本十年期间，在低能量和中等能量的离子束照射的目标的表面上的纳米粒子的生产已经发展到对主要图案特征的显著程度的控制。然而，仍然有一个广泛的实验分散的类型和相关性的各种动态界面特性诱导这种技术作为系统类型和参数的函数。与此同时，存在不同的理论模型，它们在再现如此广泛的实验特征的能力上各不相同。我们提供了一个概述的最新研究的nanoripple和点生产离子束溅射，特别注意实验和（连续）模型之间的比较，并专注于那些仍然开放的问题，或者至少是模棱两可的。这些可能是更明显的纳米点图案的情况下amorphizable目标比nanoripples的情况下，由于，可能是相对新颖的前者。要考虑的图案性质是具有潜在增加的技术重要性的那些性质，诸如纳米点尺寸随参数如离子能量、靶温度和溅射时间的变化（即，能量密度），以及增强图案顺序的质量的条件，诸如波长粗化和顺序增强的问题变得相关。
英文摘要：
The production of nanopatterns on the surfaces of targets irradiated by ion beams at low and intermediate energies has developed during the present decade to a salient degree of control over the main pattern features. However, there is still a wide experimental scatter in the type and relevance of various dynamic interfacial properties induced by this technique as a function of system type and parameters. In parallel, diverse theoretical models exist that differ in their capabilities to reproduce such a wide range of experimental features. We provide an overview of the most recent studies of nanoripple and dot production by ion-beam sputtering, with special attention to the comparison between experiments and (continuum) models, and with a focus on those issues that remain open or, at least, ambiguous. These are perhaps more evident for the case of nanodot patterns on amorphizable targets than for the case of nanoripples due, possibly, to the relative novelty of the former. The pattern properties to be considered are those of potential increased technological importance, such as the variation of nanodot size with parameters like ion energy, target temperature and sputtering time (i.e., fluence), as well as the conditions under which the quality of the pattern order is enhanced, issues such as wavelength coarsening and order enhancement becoming relevant.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
