正入射离子刻蚀Si表面纳米图案化：金属掺杂对表面形貌演化的影响
Nanopatterning of Si surfaces by normal incident ion erosion: influence of metal incorporation on surface morphology evolution
摘要：
研究了Si（100）表面在1200 eV Ar+离子正入射轰击下，金属掺杂和非金属掺杂的形貌演化。只有当表面的固定Fe浓度高于8 × 10^14 cm^-2时，才能观察到纳米点图案的形成。这是解释在一个额外的表面不稳定性，由于不均匀的溅射与金属富集在纳米点。在低金属浓度下，平滑化占主导地位，因此抑制了斑图形成。渐近功率谱密度函数从k^-2到k^-4的转变支持了弹道平滑和离子增强粘性流是表面弛豫的两种主要机制的结论。
英文摘要：
The morphology evolution of Si (100) surfaces under 1200 eV Ar+ ion bombardment at normal incidence with and without metal incorporation is presented. The formation of nanodot patterns is observed only when the stationary Fe concentration in the surface is above 8x10^14 cm^-2. This is interpreted in terms of an additional surface instability due to non-uniform sputtering in connection with metal enrichment at the nanodots. At low metal concentration smoothing dominates and pattern formation is thus inhibited. The transition from a k^-2 to a k^-4 behavior in the asymptotic power spectral density function supports the conclusion that ballistic smoothing and ion-enhanced viscous flow are the two dominant mechanisms of surface relaxation.
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