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arXiv physics/0609063physics.optics
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纳米光栅电子干涉测量

Electron interferometry with nano-gratings

Alexander D. Cronin, Ben McMorran

摘要:

提出了一种基于双纳米光栅近场衍射的电子干涉仪。Lau条纹观察与成像检测器,并在条纹的可见性发生的复苏光栅之间的间隔从0增加到3毫米。这验证了纳米结构衍射的电子束传播后保持相干远大于塔尔博特长度$z_T = 2d^2/λ$ = 1.2毫米,因此是一个证明的Talbot-Lau干涉仪的电子的功能的原理。由于相位物体的扭曲条纹演示了这种新型的电子干涉仪的应用。

英文摘要:

We present an electron interferometer based on near-field diffraction from two nanostructure gratings. Lau fringes are observed with an imaging detector, and revivals in the fringe visibility occur as the separation between gratings is increased from 0 to 3 mm. This verifies that electron beams diffracted by nanostructures remain coherent after propagating farther than the Talbot length $z_T = 2d^2/λ$ = 1.2 mm, and hence is a proof of principle for the function of a Talbot-Lau interferometer for electrons. Distorted fringes due to a phase object demonstrates an application for this new type of electron interferometer.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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