超薄晶体硅薄膜的制备技术
Technology for Production of Ultra-Thin Crystal Silicon Membranes
摘要：
我们制作了自支撑薄膜形状的超薄晶体靶，用于低能电子发射的参量X射线实验。本文简要介绍了硅晶体膜的生产技术和膜厚测量技术。在1.0 mm直径下，实现了由~200微米厚度的2x2 mm硅衬底支撑的~0.5微米的膜厚度。开发的薄晶体膜生产技术也可应用于各种含膜传感器的制造
英文摘要：
Ultra-thin crystal targets in shape of self-supporting membranes were produced for our experiments with parametric x-rays emitted by low-energy electrons. Concise description of the technology developed for production of silicon crystal membranes and the technique for the membrane thickness measurements are considered in the paper. Membrane thickness of ~0.5 micron at 1.0 mm diameter supporting by 2x2 mm silicon substrate of ~200 microns thickness is achieved. Developed technology for thin crystal membrane production can also be applied for manufacturing of various membrane-containing sensors
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
