基于腔体的极紫外光刻紧凑型光源
Cavity-based compact light source for extreme ultraviolet lithography
AI总结：
本文提出一种基于超导能量回收直线加速器的谐波激射再生放大器自由电子激光极紫外光源，通过降低电子束能量至传统方案的1/√n，以0.33 GeV和16毫米波荡器实现约2千瓦平均功率，显著缩小设施规模。
摘要：
高功率极紫外（EUV）光源是纳米级集成电路大规模量产的关键技术。在过去几十年中，激光产生等离子体（LPP）光源已在该领域得到广泛应用。然而，当前的LPP光源可能无法提供足够的平均功率，以支持未来3纳米节点及以下制程的生产。在此背景下，基于加速器的光源被视为极紫外光刻的有前景工具。本文提出了一种由超导能量回收直线加速器（ERL）驱动的、具有谐波激射的再生放大器自由电子激光极紫外光源。通过利用第n次谐波，所需电子束能量降低至传统方案的1/√n。所提出的配置采用约0.33 GeV的电子束能量和短周期（16毫米）波荡器，预计可提供约2千瓦的平均极紫外功率。与其他基于加速器的方案相比，该方法显著降低了所需电子能量和设施规模，从而为利用低能量ERL构建高功率极紫外光源提供了新的可能性。
英文摘要：
A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this field. However, current LPP light sources may provide insufficient average power to enable future manufacturing at the 3 nm node and below. In this context,accelerator-based light sources are being considered as promising tools for EUV lithography. This paper proposes a regenerative amplifier free-electron laser EUV source with harmonic lasing, drivenby a superconducting energy-recovery linac (ERL). By utilizing the nth harmonic, the required electron beam energy is reduced to 1/sqrt(n) of that in conventional schemes. The proposed configuration, employing an electron beam energy of approximately 0.33 GeV with a short-period (16 mm) undulator, is estimated to provide an average EUV power of about 2 kW. This approach significantly reduces the required electron energy and facility size relative to other accelerator-based proposals,thereby offering new possibilities for constructing high-power EUV sources with low-energy ERLs.
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