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arXiv 2410.03301cond-mat.mtrl-scicond-mat.str-el
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通过Ti掺杂提高金属性SrNbO3的透明度

Boosting the transparency of metallic SrNbO3 through Ti doping

Shammi Kumar, Liang Si, Karsten Held, Sankar Dhar, Rakesh Kumar, Priya Johari

AI总结:

本文通过Ti掺杂调控SrNbO3薄膜的光电导率,在保持高可见光透明度的同时降低电阻,获得优于ITO的品质因数,为下一代无铟透明导体设计提供了新思路。

摘要:

近年来,人们开发了多种材料以减少工业对铟的依赖,铟是当前一代器件中使用的透明导电氧化物(TCOs)的主要成分。无铟TCOs的主要候选材料是钒酸锶、铌酸锶和钼酸锶——这些强关联钙钛矿体系具有高本征电导率和优异的透明度。在本工作中,我们聚焦于铌酸锶薄膜,并通过Ti掺杂调控其光电导率,Ti掺杂使等离子体频率发生移动并降低电子关联。这使我们能够在保持可见光谱高透明度的同时,实现Ti掺杂SNO薄膜的低电阻。对于x = 0.3,我们获得了10.3($10^{-3}Ω^{-1}$)的最优品质因数(FOM)。该FOM显著优于锡掺杂氧化铟(ITO)以及其他几种已提出的透明导体材料的光电性能。我们的研究为设计下一代透明导体铺平了道路,并以密度泛函理论(DFT)和动力学平均场理论(DMFT)的见解为指导。

英文摘要:

In recent years, various materials have been developed to reduce the reliance of industries on Indium, a primary component of transparent conducting oxides (TCOs) used in the current generation of devices. The leading candidates for indium free TCOs are strontium vanadates, niobates and molybdates -- strongly correlated perovskite systems that exhibit high intrinsic electrical conductivity and optimal transparency. In this work, we focus on the strontium niobate thin films and manipulate its optical conductivity by Ti doping, which shifts the plasma frequency and reduces electronic correlations. This allows us to achieve a low resistance for Ti doped SNO thin films, while maintaining a high transparency in the visible spectrum. We obtain the optimal figure-of-merit (FOM) of 10.3 ($10^{-3}Ω^{-1}$) for $x = 0.3$. This FOM significantly outperforms the optoelectronic capabilities of Tin-doped Indium oxide (ITO) and several other proposed transparent conductor materials. Our research paves the way for designing the next generation of transparent conductors, guided by insights from density-functional theory (DFT) and dynamical mean-field theory (DMFT).

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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