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arXiv 2303.18014cond-mat.mtrl-sciphysics.comp-ph
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WX2N4(X = Si, Ge)单层的低温热电性能与光电性质

Low-Temperature Thermoelectric Performance and Optoelectronic Properties of Monolayer of WX2N4(X = Si, Ge)

Chayan Das, Dibyajyoti Saikia, Atanu Betal, Satyajit Sahu

AI总结:

本研究基于密度泛函理论和玻尔兹曼输运方程,探讨了WX2N4(X=Si, Ge)单层的热电性能,发现p型WGe2N4在400K下具有高达0.91的热电优值,而WSi2N4在室温下ZT值较低。

摘要:

我们使用密度泛函理论结合玻尔兹曼输运方程,研究了WX2N4二维单层的热电性质。对于p型WGe2N4,我们在400K下获得了0.91的优异热电优值,而在相同温度下其n型的ZT值为0.56。另一方面,WSi2N4在室温下显示出显著较低的ZT值。

英文摘要:

We investigated the thermoelectric properties of the 2D monolayer of WX2N4 using Density Functional Theory combined with Boltzmann Transport Equation. We obtained an outstanding thermoelectric figure of merit of 0.91 at 400K for p-type WGe2N4, whether it showed a ZT value of 0.56 for n-type at the same temperature. On the other hand, the WSi2N4 showed significantly low ZT at room temperature.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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