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arXiv 2205.09427cond-mat.mes-hallcond-mat.mtrl-scicond-mat.otherphysics.app-phphysics.optics
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用p掺杂量子点势垒测量$InAs/In(Ga)As$量子点的量子限制斯塔克效应

Measurement of the quantum-confined Stark effect in $InAs/In(Ga)As$ quantum dots with p-doped quantum dot barriers

Joe Mahoney, Mingchu Tang, Huiyun Liu, Nicolás Abadía

摘要:

研究了非有意掺杂和p掺杂InAs/In(Ga)As量子点的量子限制斯塔克效应,比较了它们在光调制器中的性能。测量结果表明,掺杂的QD势垒导致更好的品质因数$(FoM)$,定义为反向偏置电压摆幅的吸收$Δα$的变化与$1 V$ $α(1 V)$处的损耗的比率,$FoM=Δα/α(1 V)$。改进的性能是由于基态吸收峰的存在和斯塔克位移的附加分量。测量表明,当与具有NID QD势垒的叠层相比时,p掺杂QD势垒可以导致在-73 $°$ C至100 $°$ C的温度之间FoM调制器性能增加超过3 $\times$。

英文摘要:

The quantum-confined Stark effect in InAs/In(Ga)As quantum dots (QDs) using non-intentionally doped and p-doped QD barriers was investigated to compare their performance for use in optical modulators. The measurements indicate that the doped QD barriers lead to a better figure of merit $(FoM)$, defined as the ratio of the change in absorption $Δα$ for a reverse bias voltage swing to the loss at $1 V$ $α(1 V)$, $FoM=Δα/α(1 V)$. The improved performance is due to the absence of the ground-state absorption peak and an additional component to the Stark shift. Measurements indicate that p-doping the QD barriers can lead to more than a 3$\times$ increase in FoM modulator performance between temperatures of -73 $°$C to 100 $°$C when compared with the stack with NID QD barriers.

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