AlAs插入层下InAs/GaAs量子点的电子共振隧穿
Electron resonant tunneling through InAs/GaAs quantum dots embedded in a Schottky diode with an AlAs insertion layer
摘要：
采用分子束外延技术制备了自组装InAs/GaAs量子点肖特基共振隧穿二极管。由于AlAs插入势垒的存在，有效地降低了热电流，在77 K的高温下观察到了电子在正向和反向偏压条件下通过量子点的共振隧穿.量子点的基态位于GaAs基体导带之下~0.19eV处。理论计算与实验数据相符合。
英文摘要：
Molecular beam epitaxy is employed to manufacture self-assembled InAs/GaAs quantum dot Schottky resonant tunneling diodes. By virtue of a thin AlAs insertion barrier, the thermal current is effectively reduced and electron resonant tunneling through quantum dots under both forward and reverse biased conditions is observed at relatively high temperature of 77K. The ground states of quantum dots are found to be at ~0.19eV below the conduction band of GaAs matrix. The theoretical computations are in conformity with experimental data.
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