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arXiv 2203.01783cond-mat.dis-nncond-mat.mes-hall
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Ti-Si非晶合金中specific heat在金属-绝缘体转变时的临界行为

Critical behavior of the specific heat in Ti-Si amorphous alloys at the metal-insulator transition

A. Rogachev, H. Ikuta, U. Mizutani

摘要:

在本文中,我们报告的比热的非晶$Ti_{9.5}Si_{90.5}$合金位于非常接近的金属-绝缘体转变的临界点的测量。在磁场的存在下,比热主要由非晶Si基质中的悬空键引起的磁矩引起的肖特基异常决定。减去这一贡献暴露的电子比热系数$γ$的行为。该系数是温度无关的2 K以上,是,在数量级上,接近预期的值,在没有电子-电子相互作用。在0.4-1.5 K温度范围内,系数$γ$表现出反常的下降,可以用$γ\left(T\right)=γ_0ln{(T/T_0)}$与$T_0\approx0.2$ K的关系来近似。在一篇配套论文中,我们发现Ti-Si合金中的霍尔系数在高达150 K的更高温度下受到电子-电子相互作用的影响,并且在金属-绝缘体转变过程中也发生了重大变化。我们比较了我们的结果与理论预测的三个模型,这可以潜在地解释的异常行为的比热:广义非线性$σ$模型,库仑玻璃,和多体局域化。

英文摘要:

In this paper, we report the measurements of specific heat of an amorphous $Ti_{9.5}Si_{90.5}$ alloy located very close to the critical point of the metal-insulator transition. In the presence of a magnetic field, the specific heat is dominated by the Schottky anomaly caused by magnetic moments associated with the dangling bonds in the matrix of amorphous Si. Subtraction of this contribution exposes the behavior of the electronic specific heat coefficient $γ$. The coefficient is temperature-independent above 2 K and is, in order of magnitude, close to the value expected in the absence of electron-electron interactions. In the temperature range 0.4-1.5 K, the coefficient $γ$ shows an anomalous downturn, which can be approximated by the dependence $γ\left(T\right)=γ_0ln{(T/T_0)}$, with $T_0\approx0.2$ K . In a companion paper, we found that the Hall coefficient in Ti-Si alloys is affected by the electron-electron interaction up to much higher temperature of 150 K and also varies critically across the metal-insulator transition. We compare our results with theoretical predictions for three models, which can potentially explain the anomalous behavior of the specific heat: generalized non-linear $σ$ model, Coulomb glass, and many-body localization.

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