LCLS-II-HE验证冷冻机腔的等离子体清洁
Plasma Cleaning of LCLS-II-HE verification cryomodule cavities
摘要：
等离子体清洗是一种可以在低温模块中原位应用于超导射频（SRF）腔的技术，以降低其场发射水平。我们开发了直线加速器相干光源II（LCLS-II）腔的技术，并在本文中，我们提出了全面的发展和应用等离子体处理LCLS-II高能量（HE）验证低温（VCM）。我们在VCM上验证了我们的等离子体处理程序，完全处理了该CM的八个腔中的四个，表明腔性能在加速场和品质因数方面都得到了保留。将等离子体处理应用于这种清洁的、破纪录的低温恒温器还表明，没有污染物被引入到串中，从而保持VCM场致发射自由达到每个腔体所达到的最大场。我们还发现，等离子体处理消除了多次放电（MP）引起的猝灭，通常经常观察到的MP带场范围内。这表明，等离子体处理可以在CM中原位采用，以减轻场发射和多重碰撞，显著减少低温模块的测试时间，直线加速器调试时间和成本，并增加加速器的可靠性。
英文摘要：
Plasma cleaning is a technique that can be applied in superconducting radio-frequency (SRF) cavities in situ in cryomodules in order to decrease their level of field emission. We developed the technique for the Linac Coherent Light Source II (LCLS-II) cavities and we present in this paper the full development and application of plasma processing to the LCLS-II High Energy (HE) verification cryomodule (vCM). We validated our plasma processing procedure on the vCM, fully processing four out of eight cavities of this CM, demonstrating that cavities performance were preserved in terms of both accelerating field and quality factor. Applying plasma processing to this clean, record breaking cryomodule also showed that no contaminants were introduced in the string, maintaining the vCM field emission-free up to the maximum field reached by each cavity. We also found that plasma processing eliminates multipacting (MP) induced quenches that are typically observed frequently within the MP band field range. This suggests that plasma processing could be employed in situ in CMs to mitigate both field emission and multipacting, significantly decreasing the testing time of cryomodules, the linac commissioning time and cost and increasing the accelerator reliability.
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