衬底温度对多层溅射法在Nb衬底上生长Nb3Sn薄膜的影响
Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering
摘要：
在室温~ 250 °C的衬底温度范围内，采用多层连续溅射法在Nb上制备了Nb 3Sn薄膜。然后将多层在单独的真空炉内在950 °C下退火3小时。利用X射线衍射仪、扫描电子显微镜、X射线能谱仪、原子力显微镜和透射电子显微镜对薄膜的材料性能进行了表征。用四探针电阻率测量方法研究了薄膜从室温到超导临界温度Tc以下的超导特性。最高的膜Tc为17.76 K，当多层膜在室温下沉积时获得。在衬底温度为250 °C时沉积的Nb_3Sn超导薄膜具有较光滑的表面形貌和较低的Tc（17.58 K）。
英文摘要：
Nb3Sn films were fabricated by multilayer sequential sputtering on Nb at substrate temperatures ranging from room temperature to 250 °C. The multilayers were then annealed inside a separate vacuum furnace at 950 °C for 3h. The films material properties were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmission electron microscopy. The films superconducting properties were studied by four-point probe resistivity measurements from room temperature to below the superconducting critical temperature Tc. The highest film Tc was 17.76 K, obtained when the multilayers were deposited at room temperature. A superconducting Nb3Sn thin film with a smoother surface morphology but a lower Tc of 17.58 K was obtained on the film deposited at a substrate temperature of 250 °C.
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