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arXiv 1803.02417cond-mat.supr-con

Room temperature deposition of superconducting Niobium Nitride films by ion beam assisted sputtering

Tomas Polakovic, Sergi Lendinez, John E. Pearson, Axel Hoffmann, Volodymyr Yefremenko, Clarence L. Chang, Whitney Armstrong, John Arrington, Kawtar Hafidi, Gora… 展开作者

Tomas Polakovic, Sergi Lendinez, John E. Pearson, Axel Hoffmann, Volodymyr Yefremenko, Clarence L. Chang, Whitney Armstrong, John Arrington, Kawtar Hafidi, Goran Karapetrov, Valentine Novosad

英文摘要:

We use room temperature ion beam assisted sputtering (IBAS) to deposit niobium nitride thin films. Electrical and structural characterizations were performed by electric transport and magnetization measurements at variable temperatures, X-ray diffraction and atomic force microscopy. Compared to reactive sputtering of NbN, films sputtered in presence of an ion beam show remarkable increase in the superconducting critical temperature T$_{\rm{c}}$, while exhibiting lower sensitivity to nitrogen concentration during deposition. Thickness dependence of the superconducting critical temperature is comparable to films prepared by conventional methods at high substrate temperatures and is consistent with behavior driven by quantum size effects or weak localization.

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