纳米压印光刻制备宽带高性能太赫兹偏振器及其先进应用

用于浸没应用的通过纳米压印光刻制造的光纤上的高refractive index菲涅耳透镜

High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications

在这封信中，我们提出了一个菲涅耳透镜上的光纤端部制作。该透镜是使用纳米压印光刻的功能性高折射率材料，这是适合于大规模生产。与传统的纤维透镜相比，所提出的菲涅尔透镜的主要优点是其高折射率（n=1.69），这使得即使在诸如水或粘合剂的其他介质内也能够有效地聚焦光。在浸没液体（n=1.51）中的透镜性能的测量示出了对于660 nm的波长在1/e2强度水平下直径为810 nm的近衍射极限焦斑。这种光纤透镜的应用包括集成光学、光阱和光纤探针。

Over 100% Light Extraction Enhancement of Organic Light Emitting Diodes Using Flat Moire Micro-Lens Array Fabricated by Double Nanoimprint Lithography Over a Large Area

To improve the light extraction efficiency of organic light emitting diodes (OLEDs), we developed a novel substrate, i.e., a metamaterial based flat Moire micro-lens array formed using double nanoimprint, termed Mlens-array, consisting of a hexagonal moiré pattern pillar array. By choosing a low refractive index dielectric material for the pillar array and a high refractive index dielectric material for the layer capped on top of the pillar array, we fabricated the Mlens-array behaving as a conventional convex optical micro-lens array. The Mlens-array was fabricated on a 4-inch wafer-size glas…

纳米压印技术在薄膜多晶硅太阳能电池中集成二维周期性纳米图案

Integration of a 2D Periodic Nanopattern Into Thin Film Polycrystalline Silicon Solar Cells by Nanoimprint Lithography

实验研究了利用纳米压印光刻和干法刻蚀技术制备的二维周期性纳米图形在铝诱导结晶（AIC）多晶硅（Poly-Si）薄膜太阳电池中的集成。与未图案化的电池相比，由于纳米图案，已经实现了光吸收的6%的增加，这又将短路电流从20.6 mA/cm 2增加到23.8 mA/cm 2。另一方面，效率从6.4%有限地增加到6.7%。我们使用的转移长度法（TLM），纳米图案引起的表面形貌修改增加了减反射膜（ARC）层的薄层电阻，以及ARC层和发射极前接触之间的接触电阻。这又导致纳米图案化电池的串联电阻增加，这转化为填充因子减小，解释了效率的有限增加。

Towards High Throughput Large Area Metalens Fabrication using UV-Nanoimprint lithography and Bosch Deep Reactive Ion Etching

We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive Ion Etching (RIE) and pulsed Bosch Deep Reactive Ion Etching (DRIE). As the research field of metasurfaces moves towards applications these techniques are relevant as potential replacements of commonly used cost-intensive fabrication methods utilizing Electron Beam Lithography. We show that washboard-type sidewall surface roughness arising from the Bosch DRI…

通过高通量纳米压印光刻制造的可重构、耐温度相变超表面

Reconfigurable, Temperature Resilient Phase-Change Metasurfaces Fabricated via High Throughput Nanoimprinting Lithography

本文提出一种基于高通量纳米压印光刻的可扩展制造策略，通过直接压印TiO2纳米颗粒浆料并沉积Sb2Se3相变薄膜，实现了耐高温的可重构超表面，展示了可调谐光谱切换和手性光学活性切换两种功能。

接触-干涉混合光刻：迈向跨尺度周期性微结构的可扩展制造及红外微偏振器阵列演示

Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array

本文提出一种结合激光干涉光刻与接触光刻的混合制造方法，通过四步工艺构建单层微偏振器阵列图案，显著缩短图案化时间并减小拼接误差，在3-15μm波段实现高透射率与高消光比，为跨尺度周期性微结构提供低成本高效制造路径。

单波段和多波段THz超材料偏振器

Single and multiband THz Metamaterial Polarizers

我们报告单波段和多波段线偏振器太赫兹（THz）频率使用切割线超材料（MM）。采用有限元法设计了该结构，采用电子束光刻技术制作了该结构，并利用THz时域光谱技术对该结构进行了表征。MM单元电池由半绝缘砷化镓上的单或多个长度的金切割线焊盘组成，用于单或多波段偏振器。基于传输线模型解释了单波段偏振器的谐振频率与切割线长度的关系。

可扩展的多层混合超表面器件纳米压印制造

Scalable nanoimprint manufacturing of multi-layer hybrid metasurface device

该研究利用纳米压印光刻的高分辨率和三维图案转移能力，制造多层超表面偏振成像器件，实现亚100纳米结构和高对准精度，为低成本、高通量的超表面可扩展生产铺平道路。

Enhancing Light Extraction of Organic Light Emitting Diodes by Deep-Groove High-index Dielectric Nanomesh Using Large-area Nanoimprint

To solve the conventional conflict between maintaining good charge transport property and achieving high light extraction efficiency when using micro/nanostructure patterned substrates to extract light from organic light emitting diodes (OLEDs), we developed a novel OLED structure, termed High-index Deep-Groove Dielectric Nanomesh OLED (HDNM-OLED), fabricated by large-area nanoimprint lithography (NIL). The key component is a nanostructure-patterned substrate embedded with a high-index deep-groove nanomesh and capped with a low-index planarization layer. The high-index and deep-groove nanomesh…

用类螺旋手征材料构造宽带圆偏振器

Broadband Circular Polarizers Constructed by Helix-like Chiral Metamaterials

本文提出了一种可以通过多种传统光刻或电子束光刻技术实现的类螺旋手征超材料，以实现类似于螺旋超材料的宽带双各向异性光学响应。在扭曲超材料的基础上，通过调整晶格内的相对取向，将弧的各向异性转化为紧密排列的弧对之间的磁电耦合，从而获得宽范围的双各向异性光学响应。通过连接相邻的上弧和下弧，将超颖表面对的耦合转换为三维夹杂物的耦合，并提供更宽和更高的双各向异性光学响应。仅对于四层螺旋状超材料，最大消光比可以达到19.7。工作波段为4.69 ~ 8.98 μm，平均消光比为6.9。在整个工作波段内，选择性偏振透过率均在0.8以上。这种结构是有希望的集成和可扩展的宽带圆偏振器，特别是有很大的潜力，作为宽带圆微偏振器在全斯托克斯细分焦平面偏振计领域。

Scalably manufactured high-index atomic layer-polymer hybrid metasurfaces for high-efficiency virtual reality metaoptics in the visible

Metalenses, which exhibit superior light-modulating performance with sub-micrometer-scale thicknesses, are suitable alternatives to conventional bulky refractive lenses. However, fabrication limitations, such as a high cost, low throughput, and small patterning area, hinder their mass production. Here, we demonstrate the mass production of low-cost, high-throughput, and large-aperture visible metalenses using an argon fluoride immersion scanner and wafer-scale nanoimprint lithography. Once a 12-inch master stamp is imprinted, hundreds of centimeter-scale metalenses can be fabricated. To enhanc…

Fabrication of High-Aspect Ratio Nanogratings for Phase-based X-ray Imaging

Diffractive optical elements such as periodic gratings are fundamental devices in X-ray imaging - a technique that medical, material science and security scans rely upon. Fabrication of such structures with high aspect ratios at the nanoscale creates opportunities to further advance such applications, especially in terms of relaxing X-ray source coherence requirements. This is because typical grating-based X-ray phase imaging techniques (e.g., Talbot self-imaging) require a coherence length of at least one grating period and ideally longer. In this paper, the fabrication challenges in achievin…