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arXiv 2102.00076quant-phphysics.app-ph
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1- $μ$ m针孔离子注入金刚石中硅空位色心的可扩展产生

Scalable creation of silicon-vacancy color centers in diamond by ion implantation through a 1-$μ$m pinhole

L. Hunold, S. Lagomarsino, A. M. Flatae, H. Kambalathmana, F. Sledz, S. Sciortino, N. Gelli, L. Giuntini, M. Agio

摘要:

在金刚石中可控地产生量子发射体代表了单光子器件制造中的主要研究成果。在这里,我们提出了可规模生产的硅空位(SiV)色心单晶金刚石离子注入。SiV的横向位置由放置在样品前面的1- $μ$ m针孔在空间上控制,该针孔可以使用压电台以纳米精度移动。通过用照相机监测离子束位置来控制初始注入位置。由此,硅离子被注入在与衍射极限相当的区域中的期望点处。我们讨论了离子散射的针孔和激活产率的SiV色心的创建单量子发射器的作用。

英文摘要:

The controlled creation of quantum emitters in diamond represents a major research effort in the fabrication of single-photon devices. Here, we present the scalable production of silicon-vacancy (SiV) color centers in single-crystal diamond by ion implantation. The lateral position of the SiV is spatially controlled by a 1-$μ$m pinhole placed in front of the sample, which can be moved nanometer precise using a piezo stage. The initial implantation position is controlled by monitoring the ion beam position with a camera. Hereby, silicon ions are implanted at the desired spots in an area comparable to the diffraction limit. We discuss the role of ions scattered by the pinhole and the activation yield of the SiV color centers for the creation of single quantum emitters.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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