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arXiv 2005.14265physics.optics
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CMOS光子学的二维极限趋肤深度工程

Two-dimensional extreme skin depth engineering for CMOS photonics

Matthew van Niekerk, Saman Jahani, Justin Bickford, Pak Cho, Stephen Anderson, Gerald Leake, Daniel Coleman, Michael L. Fanto, Christopher C. Tison, Gregory A. … 展开作者

Matthew van Niekerk, Saman Jahani, Justin Bickford, Pak Cho, Stephen Anderson, Gerald Leake, Daniel Coleman, Michael L. Fanto, Christopher C. Tison, Gregory A. Howland, Zubin Jacob, Stefan F. Preble

摘要:

极端趋肤深度工程(e-skid)可以应用于集成光子学,以操纵波导的倏逝场。在这里,我们证明了电子防滑可以在两个方向上实现,以便确定性地设计倏逝波,从而实现具有增强功能的密集集成。特别地,通过增加趋肤深度,我们能够创建具有大操作带宽的大间隙、无限定向耦合器。在这里,我们在CMOS光子学代工厂中实验验证了集成光子学的二维e-skid,并证明了1.44 μm间隙的强耦合。

英文摘要:

Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate that e-skid can be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of large gap, bendless directional couplers with large operational bandwidth. Here we experimentally validate two-dimensional e-skid for integrated photonics in a CMOS photonics foundry and demonstrate strong coupling with a gap of 1.44 μm.

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