arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2005.03893cond-mat.mtrl-sci
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金刚石的表面电子性质

Surface electronic properties of diamond

Christoph E. Nebel

摘要:

总结了未掺杂的氢端金刚石在吸附物和电解质溶液中的表面电子性质。通过对具有原子级光滑氢终端表面的同质外延生长的CVD金刚石膜的霍尔效应、电导率、接触电势差(CPM)、扫描电子显微镜(SEM)和循环伏安数据的分析,讨论了金刚石表面导电层的形成。由于电子从价带态转移到电解质的空态(转移掺杂),产生高导电表面层。空穴以高达350 cm 2/Vs的迁移率在层中传播。片层空穴密度在10^11至5x10^12 cm^-2之间,取决于电解质的pH值。薛定谔方程和泊松方程的数值解揭示了二维态密度(DOS)分布。这已被用于制造离子敏感场效应晶体管(ISFET)。漏源电导率是pH依赖性的,具有约66 mV/pH。施加大于+0.7 V(pH 13)至+1.6 V(pH 1)的氧化阈值的电势引起强漏电流和部分表面氧化。

英文摘要:

Surface electronic properties of undoped hydrogen terminated diamond covered with adsorbates or in electrolyte solutions are summarized. The formation of a conductive layer at the surface of diamond is discussed based on Hall effect, conductivity, contact potential difference (CPM), scanning electron microscopy (SEM), and cyclic voltammetry data applied on homoepitaxially grown CVD diamond films with atomically smooth hydrogen terminated surfaces. Due to electron transfer from valence band states into empty states of the electrolyte (transfer doping), a highly conductive surface layer is generated. Holes propagate in the layer with mobilities up to 350 cm2/Vs. The sheet hole density is in the range 10^11 to 5x10^12 cm^-2, and dependents on pH of the electrolyte. Numerical solutions of the Schrodinger and Poisson equations reveal a 2D density of state (DOS) distribution. This has been utilized to manufacture ion-sensitive field effect transistors (ISFET). The drain source conductivity is pH dependent, with about 66 mV/pH. Application of potentials larger than the oxidation threshold of +0.7 V (pH 13) to +1.6 V (pH 1) gives rise to strong leakage currents and to partial surface oxidation.

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