arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2003.10677cond-mat.mtrl-scicond-mat.mes-hallcond-mat.str-el
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Characteristic Lengths of Interlayer Charge-Transfer in Correlated Oxide Heterostructures

Ganesh Ji Omar, Mengsha Li, Xiao Chi, Zhen Huang, Zhi Shiuh Lim, Saurav Prakash, Shengwei Zeng, Changjian Li, Xiaojiang Yu, Chunhua Tang, Dongsheng Song, Andriv… 展开作者

Ganesh Ji Omar, Mengsha Li, Xiao Chi, Zhen Huang, Zhi Shiuh Lim, Saurav Prakash, Shengwei Zeng, Changjian Li, Xiaojiang Yu, Chunhua Tang, Dongsheng Song, Andrivo Rusydi, Thirumalai Venkatesan, Stephen John Pennycook, Ariando Ariando

英文摘要:

Using interlayer interaction to control functional heterostructures with atomic-scale designs has become one of the most effective interface-engineering strategies nowadays. Here, we demonstrate the effect of a crystalline LaFeO3 buffer layer on amorphous and crystalline LaAlO3/SrTiO3 heterostructures. The LaFeO3 buffer layer acts as an energetically favored electron acceptor in both LaAlO3/SrTiO3 systems, resulting in modulation of interfacial carrier density and hence metal-to-insulator transition. For amorphous and crystalline LaAlO3/SrTiO3 heterostructures, the metal-to-insulator transition is found when the LaFeO3 layer thickness crosses 3 and 6 unit cells, respectively. Such different critical LaFeO3 thicknesses are explained in terms of distinct characteristic lengths of the redox-reaction-mediated and polar-catastrophe-dominated charge transfer, controlled by the interfacial atomic contact and Thomas-Fermi screening effect, respectively. Our results not only shed light on the complex interlayer charge transfer across oxide heterostructures but also provides a new route to precisely tailor the charge-transfer process at a functional interface.

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