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arXiv 2001.08580cond-mat.str-el
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W掺杂VO2在500 T磁场诱导的绝缘体-金属转变

Magnetic-field-induced insulator-metal transition in W-doped VO2 at 500 T

Yasuhiro H. Matsuda, Daisuke Nakamura, Akihiko Ikeda, Shojiro Takeyama, Yuji Muraoka, Yuki Suga

摘要:

关联电子系统中的金属-绝缘体(MI)相变一直是材料科学中的一个中心问题,也是一个有争议的问题。二氧化钒(VO 2)在340 K时发生一级MI转变。半个多世纪以来,人们一直在争论是否电子相关性或结构不稳定性,由于二聚V离子是更重要的驱动力背后的MI转变。在这里,我们表明,500 T的超导磁场使钨(W)掺杂的VO 2金属的绝缘体相。V离子的d电子上的自旋塞曼效应使绝缘相中的二聚体解离,导致电子离域。由于Mott-Hubbard能隙本质上不依赖于自旋自由度,结构不稳定性可能是MI转变背后更重要的驱动力。

英文摘要:

Metal-insulator (MI) transitions in correlated electron systems have long been a central and controversial issue in material science. Vanadium dioxide (VO2) exhibits a first-order MI transition at 340 K. For more than half a century, it has been debated whether electronic correlation or the structural instability due to dimerised V ions is the more essential driving force behind this MI transition. Here, we show that an ultrahigh magnetic field of 500 T renders the insulator phase of tungsten (W)-doped VO2 metallic. The spin Zeeman effect on the d electrons of the V ions dissociates the dimers in the insulating phase, resulting in the delocalisation of electrons. Because the Mott-Hubbard gap essentially does not depend on the spin degree of freedom, the structural instability is likely to be the more essential driving force behind the MI transition.

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