arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1909.03451physics.plasm-phphysics.acc-ph
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电子回旋共振离子源中等离子体电位和密度的空间分布

Spatial distributions of plasma potential and density in electron cyclotron resonance ion source

V. Mironov, S. Bogomolov, A. Bondarchenko, A. Efremov, V. Loginov, D. Pugachev

摘要:

本文应用电子回旋共振离子源的数值高级模型(NAM-ECRIS)研究了离子源中的物理过程。NAM-ECRIS的分别操作的电子和离子模块的解决方案以迭代的方式进行匹配,以获得等离子体密度和等离子体电势的空间分布。结果显示,在ECR表面附近和源轴上等离子体密度最大的复杂轮廓。离子捕获势的下降在~(0.01-0.05)V的水平上,位于等离子体密度最大值处。高电荷离子也被定位在ECR表面附近。偏置电极效应是由于电子从偏置电极和提取孔反射而形成的沿源轴的电子串。该串使得高电荷离子的轮廓在源轴上更加尖峰化,从而增加了提取的离子电流。

英文摘要:

The Numerical Advanced Model of Electron Cyclotron Resonance Ion Source (NAM-ECRIS) is applied for studies of the physical processes in the source. Solutions of separately operating electron and ion modules of NAM-ECRIS are matched in iterative way such as to obtain the spatial distributions of the plasma density and of the plasma potential. Results reveal the complicated profiles with the maximized plasma density close to the ECR surface and on the source axis. The ion-trapping potential dips are calculated to be on the level of ~(0.01-0.05) V being located at the plasma density maxima. The highly charged ions are also localized close to the ECR surface. The biased electrode effect is due to an electron string along the source axis formed by reflection of electrons from the biased electrode and the extraction aperture. The string makes profiles of the highly charged ions more peaked on the source axis, thus increasing the extracted ion currents.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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