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arXiv 1812.02441cond-mat.mtrl-sci
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V $_2$ O $_5$和MoO $_3$块体和叠层的结构和电子性质

Structural and electronic properties of V$_2$O$_5$ and MoO$_3$ bulk and ultrathin layers

Tilak Das, Sergio Tosoni, Gianfranco Pacchioni

摘要:

采用第一性原理密度泛函理论(DFT)计算和范德华色散修正,研究了V $_2$ O $_5$和MoO $_3$层状氧化物的体相、单层膜和多层膜的结构和电子性质.特定的DFT+U泛函已被测试,以正确地再现几何形状,带隙,静态介电常数,和两种材料的形成的结晶。单层和多层分别沿着<001><010>V2 O 5和MoO 3的和稳定的晶体学取向解理。两种材料都需要至少三层,以恢复块状性质。自旋-轨道效应已被纳入我们的预测,但它们显示边际效应。

英文摘要:

The structural and electronic properties of bulk, monolayer and ultrathin films of V$_2$O$_5$ and MoO$_3$ layered oxides have been studied with first-principles density functional theory calculations including Van der Waals dispersion corrections. Specific DFT+U functionals have been tested in order to properly reproduce geometry, band-gap, static dielectric constant, and formational enthalpies of the two materials. The mono-, and multi-layers are cleaved along the <001> and <010> stable crystallographic orientations for V2O5 and MoO3, respectively. At least three layers are needed for both materials in order to recover bulk-like properties. Spin-orbit effects have been incorporated in our prediction, but they show marginal effects.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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