射频表面等离子体源中的碳膜
Carbon Film in Radio Frequency Surface Plasma Source with Cesiation
摘要：
据推测，SNS RF SPS中的持续cesiation与在套环转换器上的碳膜沉积有关。具有碱沉积的石墨的功函数依赖性没有金属和半导体的典型最小值，并且最终功函数更高。由于这个原因，来自铯化金属和半导体的H-二次发射的概率可以高于来自铯化碳膜的H-二次发射的概率，但是碳膜保持铯化更长时间并且可以以低铯消耗操作。
英文摘要：
It is assumed that persistent cesiation in the SNS RF SPS is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
