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arXiv 1804.00201cond-mat.mtrl-sci
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晶体取向在UO $_2$薄膜溶解中的作用

The Role of Crystal Orientation in the Dissolution of UO$_2$ Thin Films

S. Rennie, E. Lawrence Bright, J. E. Sutcliffe, J. E. Darnbrough, J. Rawle, C. Nicklin, G. H. Lander, R. Springell

摘要:

外延薄膜已被用来研究二氧化铀界面的辐解溶解。沉积在单晶氧化钇稳定的氧化锆衬底上的UO $_2$的薄膜在高通量、单色、同步辐射X射线源的存在下暴露于水。特别是,这种技术被应用于诱导溶解的三个UO $_2$薄膜,生长沿原则UO $_2$晶体取向:(001),(110)和(111)。每个膜的溶解诱导为9个累积腐蚀周期,总计270s,之后记录XRR光谱以观察膜的形态变化作为暴露时间的函数。虽然发现(001)和(110)取向的膜几乎线性地腐蚀并且以相当的速率腐蚀,但是发现(111)膜显著地更耐腐蚀,在最初的90秒腐蚀期之后没有观察到UO $_2$材料的损失。这些结果清楚地表明了晶体取向对X射线诱导的UO $_2$溶解速率的影响。这一结果可能有重要的影响,理论溶解模型,因为它是显而易见的,必须考虑到取向的依赖性,以获得准确的预测UO $_2$的溶解行为。

英文摘要:

Epitaxial thin films have been utilised to investigate the radiolytic dissolution of uranium dioxide interfaces. Thin films of UO$_2$ deposited on single crystal yttria stabilised zirconia substrates have been exposed to water in the presence of a high flux, monochromatic, synchrotron x-ray source. In particular, this technique was applied to induce dissolution of three UO$_2$ thin films, grown along the principle UO$_2$ crystallographic orientations: (001), (110) and (111). Dissolution of each film was induced for 9 accumulative corrosion periods, totalling 270s, after which XRR spectra were recorded to observe the change in morphology of the films as a function of exposure time. While the (001) and (110) oriented films were found to corrode almost linearly and at comparable rates, the (111) film was found to be significantly more corrosion resistant, with no loss of UO$_2$ material being observed after the initial 90s corrosion period. These results distinctly show the effect of crystallographic orientation on the rate of x-ray induced UO$_2$ dissolution. This result may have important consequences for theoretical dissolution models, as it is evident that orientation dependence must be taken into consideration to obtain accurate predictions of the dissolution behaviour of UO$_2$.

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