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arXiv 1710.03375cond-mat.mtrl-sci
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硅离子束图形化热电声子玻璃电子晶体

Thermoelectric phonon glass electron crystal via ion beam patterning of silicon

Taishan Zhu, Krishnan Swaminathan-Gopalan, Kelly Stephani, Elif Ertekin

摘要:

离子束辐照是近年来功能材料设计的一种新方法。在这项工作中,我们表明,图案化的缺陷区域产生的离子束照射硅可以创建一个声子玻璃电子晶体(PGEC),热电的一个长期的目标。通过控制缺陷区域的有效直径和缺陷区域之间的间距,分子动力学模拟表明可以实现导热率降低$\approx$ 20倍。玻尔兹曼理论表明,热电功率因数在受损材料中基本上保持不变。为了方便玻尔兹曼理论,我们推导出一个解析模型的电子散射与圆柱形缺陷区域的基础上分波分析。我们一起预测,在室温下,这些硅超材料的最佳图案化几何形状的ZT $\approx$ 0.5或更高的品质因数。这些研究结果表明,纳米结构的图案化缺陷区域的晶体材料是一个可行的方法来实现PGEC,离子束照射可能是一个有前途的制造策略。

英文摘要:

Ion beam irradiation has recently emerged as a versatile approach to functional materials design. We show in this work that patterned defective regions generated by ion beam irradiation of silicon can create a phonon glass electron crystal (PGEC), a longstanding goal of thermoelectrics. By controlling the effective diameter of and spacing between the defective regions, molecular dynamics simulations suggest a reduction of the thermal conductivity by a factor of $\approx$20 is achievable. Boltzmann theory shows that the thermoelectric power factor remains largely intact in the damaged material. To facilitate the Boltzmann theory, we derive an analytical model for electron scattering with cylindrical defective regions based on partial wave analysis. Together we predict a figure of merit of ZT$\approx$0.5 or more at room temperature for optimally patterned geometries of these silicon metamaterials. These findings indicate that nanostructuring of patterned defective regions in crystalline materials is a viable approach to realize a PGEC, and ion beam irradiation could be a promising fabrication strategy.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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