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arXiv 1702.02307cond-mat.mes-hallcond-mat.mtrl-sci
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Rashba分裂对拓扑绝缘体薄膜中RKKY相互作用的影响

Effect of Rashba splitting on RKKY interaction in topological insulator thin films

Mahroo Shiranzaei, Fariborz Parhizgar, Hosein Cheraghchi

摘要:

本文研究了在有限和零化学势下Rashba分裂对TI薄膜中RKKY相互作用的影响。我们发现,包括TI薄膜在内的Rashba材料的自旋磁化率强烈依赖于距离矢量的方向。此外,我们发现另一项的非对角项的自旋磁化率张量,这与众所周知的DM-类项是对称的。我们展示了如何通过使用垂直于表面平面施加的电场和通过小的化学掺杂来调节RKKY相互作用,从而大幅提高RKKY项。我们已经提出了我们的结果为两种不同的情况下,即表面间配对的磁性杂质,以及内表面之一。这两种情况下的行为是完全不同的,我们通过将每个表面的态密度映射到带色散上来描述。

英文摘要:

In this work we have investigated the effect of Rashba splitting on the RKKY interaction in TI thin film both at finite and zero chemical potential. We find that the spin susceptibility of Rashba materials including TI thin film is strongly dependent on the direction of distance vector. Moreover, we find another term in the off-diagonal terms of the spin-susceptibility tensor which in contrast to the well-known DM-like term is symmetric. We show how one can tune the RKKY interaction by using electric field applied perpendicularly to the surface plane and by small chemical doping giving rise to enhance the RKKY term, drastically. We have presented our results for two different situations, namely inter-surface pairing of magnetic impurities as well as intra-surface one. The behavior of these two situations is completely different which we describe it by mapping the density of states of each surface on the band dispersion.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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