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arXiv 1609.01181physics.ins-dethep-ex
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从脉冲高度谱表征SiPMs

On the characterisation of SiPMs from pulse-height spectra

V. Chmill, E. Garutti, R. Klanner, M. Nitschke, J. Schwandt

摘要:

方法的开发,它使用在黑暗中测量的SiPM的脉冲高度光谱和脉冲光照射,以确定脉冲形状,暗计数率,增益,平均光子数启动盖革放电,即时串扰和后脉冲的概率,以及电子噪声和像素之间和像素内的增益波动。整个脉冲高度谱,包括对应于不同数量的盖革放电的峰之间的背景区域,由单函数描述。作为演示,该模型用于在20°C下,在高于击穿电压2.5 V至8 V的电压下,对面积为15 μm x 15 μm的4382个像素的KETEK SiPM进行测试。的结果进行了比较,其他方法表征SiPM。最后,给出的例子,如何完整的描述的脉冲八光谱可以用来优化SiPM的工作电压,并提出了一种方法,用于现场校准和监测的SiPM,适合于大规模的应用。

英文摘要:

Methods are developed, which use the pulse-height spectra of SiPMs measured in the dark and illuminated by pulsed light, to determine the pulse shape, the dark-count rate, the gain, the average number of photons initiating a Geiger discharge, the probabilities for prompt cross-talk and after-pulses, as well as the electronics noise and the gain fluctuations between and in pixels. The entire pulse-height spectra, including the background regions in-between the peaks corresponding to different number of Geiger discharges, are described by single functions. As a demonstration, the model is used to characterise a KETEK SiPM with 4382 pixels of 15 μm x 15 μm area for voltages between 2.5 and 8 V above the breakdown voltage at 20°C. The results are compared to other methods of characterising SiPMs. Finally, examples are given, how the complete description of the pulse-eight spectra can be used to optimise the operating voltage of SiPMs, and a method for an in-situ calibration and monitoring of SiPMs, suited for large-scale applications, is proposed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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