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arXiv 1607.07500cond-mat.mes-hall
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氧等离子体处理对中性MoS2场效应晶体管充电

Charge Neutral MoS2 Field Effect Transistors Through Oxygen Plasma Treatment

Rohan Dhall, Zhen Li, Ewa Kosmowska, Stephen B. Cronin

摘要:

光刻制造的MoS 2场效应晶体管存在几个关键缺陷,包括低亚阈值摆幅、大的导通栅极电压(VT)和宽的器件到器件可变性。VT的大幅度和可变性源于不干净的界面、底层衬底中的捕获电荷以及在机械剥离过程中产生的硫空位。在这项研究中,我们展示了一个简单而可靠的氧等离子体处理,它减轻了无意的掺杂所产生的表面缺陷,如S空位,和表面污染的影响。该等离子体处理使MoS 2恢复电荷中性,并使阈值导通电压向0 V移动。在测量的8个器件中,所有器件都表现出FET导通电压从平均-18.7V到-0.9V的偏移。氧等离子体处理钝化这些缺陷,这减少了表面散射,导致增加的迁移率和改善的亚阈值摆动。对于低迁移率(~ 0.01cm 2/V.s)的制备器件,我们观察到暴露于氧等离子体后迁移率增加高达190倍。也许这种氧等离子体处理的最重要的方面是它减少了设备到设备的可变性,这是实现这些设备的任何实际应用的关键因素。

英文摘要:

Lithographically fabricated MoS2 field effect transistors suffer from several critical imperfections, including low sub-threshold swings, large turn-on gate voltages (VT), and wide device-to-device variability. The large magnitude and variability of VT stems from unclean interfaces, trapped charges in the underlying substrate, and sulfur vacancies created during the mechanical exfoliation process. In this study, we demonstrate a simple and reliable oxygen plasma treatment, which mitigates the effects of unintentional doping created by surface defect cites, such as S vacancies, and surface contamination. This plasma treatment restores charge neutrality to the MoS2 and shifts the threshold turn-on voltage towards 0V. Out of the 8 devices measured, all exhibit a shift of the FET turn-on voltage from an average of -18.7V to -0.9V. The oxygen plasma treatment passivates these defects, which reduces surface scattering, causing increased mobility and improved subthreshold swing. For as-prepared devices with low mobilities (~0.01cm2/V.s), we observe up to a 190-fold increase in mobility after exposure to the oxygen plasma. Perhaps the most important aspect of this oxygen plasma treatment is that it reduces the device-to-device variability, which is a crucial factor in realizing any practical application of these devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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