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arXiv 1607.06405cond-mat.mes-hall
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退火对Ta/CoFeB/MgO三层膜界面Dzyaloshinskiii-Moriya相互作用的影响

Effect of annealing on the interfacial Dzyaloshinskii-Moriya interaction in Ta/CoFeB/MgO trilayers

R. A. Khan, P. M. Shepley, A. Hrabec, A. W. J. Wells, B. Ocker, C. H. Marrows, T. A. Moore

摘要:

界面的Dzyaloshinskiii-Moriya相互作用(Dzyaloshinskiii-Moriya interaction,Dzyaloshinski-Moriya interaction)已被证明可以稳定具有垂直磁各向异性的薄膜中的纯手性Néel型畴壁,并因此允许它们通过自旋霍尔扭矩传播。在这项研究中,我们表明,在Ta/Co $_{20}$ Fe $_{60}$ B $_{20}$ /MgO的结晶可能会受到退火的影响。我们发现,在230 $^{\circ}$ C退火温度下,在$D=0.057\pm0.003$ mJ $^{2}$处有一个电子吸收峰.使用纯场驱动的蠕变区域扩展技术测量磁场。磁场和各向异性场随退火温度的变化趋势相似。我们推断,的行为的超导和各向异性有关的界面晶体有序和B驱逐出CoFeB层的退火温度的增加。

英文摘要:

The interfacial Dzyaloshinskii-Moriya interaction (DMI) has been shown to stabilize homochiral Néel-type domain walls in thin films with perpendicular magnetic anisotropy and as a result permit them to be propagated by a spin Hall torque. In this study, we demonstrate that in Ta/Co$_{20}$Fe$_{60}$B$_{20}$/MgO the DMI may be influenced by annealing. We find that the DMI peaks at $D=0.057\pm0.003$ mJ/m$^{2}$ at an annealing temperature of 230 $^{\circ}$C. DMI fields were measured using a purely field-driven creep regime domain expansion technique. The DMI field and the anisotropy field follow a similar trend as a function of annealing temperature. We infer that the behavior of the DMI and the anisotropy are related to interfacial crystal ordering and B expulsion out of the CoFeB layer as the annealing temperature is increased.

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