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arXiv 2301.04823cond-mat.mes-hall
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在300 mm晶片上低温沉积高性能CoFeB/MgO/CoFeB磁性隧道结

Cryogenic temperature deposition of high-performance CoFeB/MgO/CoFeB magnetic tunnel junctions on 300 mm wafers

Tomohiro Ichinose, Tatsuya Yamamoto, Takayuki Nozaki, Kay Yakushiji, Shingo Tamaru, Makoto Konoto, Shinji Yuasa

摘要:

我们开发了一种用于在300 mm热氧化硅晶片上制备高性能CoFeB/MgO/CoFeB磁性隧道结(MTJ)的低温沉积工艺。详细研究了CoFeB薄膜的沉积温度对MTJ的纳米结构、磁性和磁输运性质的影响。当在100 K下沉积CoFeB时,MTJ表现出214 uJ/m2的垂直磁各向异性(PMA)和-45 fJ/Vm的压控磁各向异性(VCMA)系数,与室温沉积CoFeB的情况相比,分别对应于PMA和VCMA的1.4倍和1.7倍增强。MTJ性质的改善不仅仅是由于MTJ膜的形态。界面敏感的磁输运性质表明,界面质量,如在MgO/CoFeB界面的混合和氧化态的低温沉积得到改善。低温溅射沉积有望成为下一代磁阻随机存取存储器的标准制造工艺。

英文摘要:

We developed a cryogenic temperature deposition process for high-performance CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) on 300 mm thermally oxidized silicon wafers. The effect of the deposition temperature of the CoFeB layers on the nanostructure, magnetic and magneto-transport properties of the MTJs were investigated in detail. When CoFeB was deposited at 100 K, the MTJs exhibited a perpendicular magnetic anisotropy (PMA) of 214 uJ/m2 and a voltage-controlled magnetic anisotropy (VCMA) coefficient of -45 fJ/Vm, corresponding to 1.4- and 1.7-fold enhancements in PMA and VCMA, respectively, compared to the case of room-temperature deposition of CoFeB. The improvement in the MTJ properties was not simply due to the morphology of the MTJ films. The interface-sensitive magneto-transport properties indicated that interfacial qualities such as intermixing and oxidation states at the MgO/CoFeB interfaces were improved by the cryogenic temperature deposition. Cryogenic-temperature sputtering deposition is expected to be a standard manufacturing process for next-generation magnetoresistive random-access memory.

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