arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1507.04590cond-mat.stat-mechcond-mat.dis-nn
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线性$k$ -聚体在正方形晶格上随机顺序吸附的广义模型中的阻塞和渗流

Jamming and percolation in generalized models of random sequential adsorption of linear $k$-mers on a square lattice

Nikolai I. Lebovka, Yuri Yu. Tarasevich, Dmitri O. Dubinin, Valeri V. Laptev, Nikolai V. Vygornitskii

摘要:

本文用MonteCarlo模拟方法研究了线性$k$ -聚体(占据$k$相邻位置的粒子)在正方晶格上随机顺序吸附(RSA)的两种广义模型的堵塞和逾渗.经典的随机顺序吸附(RSA)模型假设没有重叠的新进入的粒子与先前沉积的。第一个模型LK $_d$是RSA模型的广义变体,用于$k$ -聚体和具有缺陷的晶格。一些占据的$k$相邻位置被认为是绝缘的,而一些晶格位置被缺陷(杂质)占据。对于该模型,即使是小浓度的缺陷也可以抑制相对长的$k$ -聚体的渗滤。第二种模型是合作顺序吸附(CSA),其中,对于每个新的$k$ -聚体,只有有限数量的横向接触$z$与先前沉积的$k$ -聚体是允许的。沉积发生在当$z\leq (1-d)z_m$,其中$z_m=2(k+1)$是$k$ -mer的接触的最大数目,并且$d$是禁止NN接触的分数的情况下。仅在某个间隔$k_{min}\leq k\leq k_{max}$处观察到渗滤,其中值$k_{min}$和$k_{max}$取决于禁用接触$d$的分数。值$k_{max}$随着$d$的增加而减小。得到了$\log(k_{max})=a+bd$型的对数依赖性,其中$a=-4.03 \pm 0.22$,$b=4.93 \pm 0.57 $。

英文摘要:

The jamming and percolation for two generalized models of random sequential adsorption (RSA) of linear $k$-mers (particles occupying $k$ adjacent sites) on a square lattice are studied by means of Monte Carlo simulation. The classical random sequential adsorption (RSA) model assumes the absence of overlapping of the new incoming particle with the previously deposited ones. The first model LK$_d$ is a generalized variant of the RSA model for both $k$-mers and a lattice with defects. Some of the occupying $k$ adjacent sites are considered as insulating and some of the lattice sites are occupied by defects (impurities). For this model even a small concentration of defects can inhibit percolation for relatively long $k$-mers. The second model is the cooperative sequential adsorption (CSA) one, where, for each new $k$-mer, only a restricted number of lateral contacts $z$ with previously deposited $k$-mers is allowed. Deposition occurs in the case when $z\leq (1-d)z_m$ where $z_m=2(k+1)$ is the maximum numbers of the contacts of $k$-mer, and $d$ is the fraction of forbidden NN contacts. Percolation is observed only at some interval $k_{min}\leq k\leq k_{max}$ where the values $k_{min}$ and $k_{max}$ depend upon the fraction of forbidden contacts $d$. The value $k_{max}$ decreases as $d$ increases. A logarithmic dependence of the type $\log(k_{max})=a+bd$, where $a=-4.03 \pm 0.22$, $b=4.93 \pm 0.57 $, is obtained.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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