基于TiZrV/Pd镀膜实验的钯膜沉积速率计算与模拟研究
Research on Pd film deposition rate calculation and simulation based on TiZrV/Pd film coating experiment
摘要:
加速器储存环真空室需要洁净的超高高真空环境。在真空室内壁沉积TiZrV吸气剂薄膜,可以实现分布式抽运,有效地提高真空度,减小纵向梯度。但N2、O2等污染物的积累会降低非蒸散型吸气剂(NEG)的吸附能力,导致NEG寿命降低。因此,在NEG薄膜上镀一层对H2具有高扩散速率和吸收能力的Pd,可以延长NEG的使用寿命,同时提高H2的抽运率。以氩气为放电气体,采用磁控溅射法在长直管中制备了TiZrV-Pd薄膜。根据扫描电子显微镜(SEM)的实验结果,分析了不同沉积参数、磁场强度、气体流量、放电电流、放电电压和工作气压下TiZrV-Pd薄膜的沉积速率。将Sigmund理论模拟结果与实验结果进行比较,结果表明,在本实验装置中,沉积速率C可以通过溅射厚度D来估算。
英文摘要:
The vacuum chamber of accelerator storage ring need clean ultra-high vacuum environment. TiZrV getter film which was deposited on interior wall of vacuum chamber, can realize distributed pumping, effectively improve the vacuum degree and reduce the longitudinal gradient. But accumulation of pollutants such as N2, O2, will decrease the adsorption ability of non-evaporable getter (NEG), which leads to the reduction of NEG lifetime. Therefore, NEG thin film coated with a layer of Pd which has high diffusion rate and absorption ability for H2, can extend the service life of NEG, and improve the pumping rate of H2 at the same time. With argon as discharge gas, magnetron sputtering method was adopted to prepare TiZrV-Pd film in long straight pipe. According to the experimental results of the scanning electron microscope (SEM), deposition rates of TiZrV-Pd films were analyzed under different deposition parameters, the magnetic field strength, the gas flow rate, discharge current, discharge voltage and working pressure. Moreover, comparing the simulation results based on Sigmund's theory and experimental results, it was shown that the deposition rate C can be estimated by the depth sputtered, D for Pd film coatings in this experiment device.
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