聚焦离子束铣削加工大尺寸电子柱的设计与实现
Design and Implementation of a Micron-Sized Electron Column Fabricated by Focused Ion Beam Milling
摘要：
我们已经设计、制造和测试了微米尺寸的电子柱，其具有约700微米的总长度，包括两个电子透镜;具有1微米的最小孔的微透镜，随后是具有直径高达50微米的孔的第二透镜，以形成相干低能电子波前。设计标准遵循缩小源尺寸、透镜尺寸和电子动能的概念，以最小化球面像差，确保平行相干电子波前。所有的透镜孔径都是采用聚焦离子束铣削的，因此可以在距光轴约300 nm的公差内精确对准。实验上，最后一列形状的准平面波前的最小全发散角为4 mrad和电子能量低至100 eV。
英文摘要：
We have designed, fabricated and tested a micron-sized electron column with an overall length of about 700 microns comprising two electron lenses; a micro-lens with a minimal bore of 1 micron followed by a second lens with a bore of up to 50 microns in diameter to shape a coherent low-energy electron wave front. The design criteria follow the notion of scaling down source size, lens-dimensions and kinetic electron energy for minimizing spherical aberrations to ensure a parallel coherent electron wave front. All lens apertures have been milled employing a focused ion beam and could thus be precisely aligned within a tolerance of about 300 nm from the optical axis. Experimentally, the final column shapes a quasi-planar wave front with a minimal full divergence angle of 4 mrad and electron energies as low as 100 eV.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
