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arXiv 1502.07231cond-mat.mtrl-sci
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原位掠入射小角X射线散射研究基于原子层沉积的介孔薄膜孔径调控

Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle x-ray scattering

Jolien Dendooven, Kilian Devloo-Casier, Matthias Ide, Kathryn Grandfield, Mert Kurttepeli, Karl F. Ludwig, Sara Bals, Pascal Van Der Voort, Christophe Detavernier

摘要:

原子层沉积(ALD)能够对多孔材料进行保形涂覆,使该技术适合在原子水平上调节孔径,例如,用于催化、气体分离和传感。然而,获得关于沉积在具有低中孔范围(< 10 nm)的直径的孔中的ALD涂层的保形性的信息并不简单。在这项工作中,它表明,在原位同步加速器为基础的掠入射小角X射线散射(GISAXS)可以提供有价值的信息,在ALD过程中的密度和内表面积的变化,在多孔二氧化钛薄膜与小的介孔(3-8 nm)。结果表明,与原位X射线荧光数据表示的多孔膜中沉积的Ti原子的量的演变是在良好的协议。两个数据集的分析表明,可以通过ALD实现的最小孔径由Ti前体分子的尺寸决定。

英文摘要:

Atomic layer deposition (ALD) enables the conformal coating of porous materials, making the technique suitable for pore size tuning at the atomic level, e.g., for applications in catalysis, gas separation and sensing. It is, however, not straightforward to obtain information about the conformality of ALD coatings deposited in pores with diameters in the low mesoporous regime (< 10 nm). In this work, it is demonstrated that in situ synchrotron based grazing incidence small angle x-ray scattering (GISAXS) can provide valuable information on the change in density and internal surface area during ALD of TiO2 in a porous titania film with small mesopores (3-8 nm). The results are shown to be in good agreement with in situ x-ray fluorescence data representing the evolution of the amount of Ti atoms deposited in the porous film. Analysis of both data sets indicates that the minimum pore diameter that can be achieved by ALD is determined by the size of the Ti-precursor molecule.

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