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arXiv 1409.7338physics.opticscond-mat.mtrl-sci
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超薄金膜的光学和结构特性

Optical and Structural Properties of Ultra-thin Gold Films

Anna Kossoy, Virginia Merk, Denis Simakov, Kristjan Leosson, Stéphane Kéna-Cohen, Stefan A. Maier

摘要:

在透明衬底上实现横向连续的超薄金膜是具有重大技术意义的挑战。在目前的工作中,超薄金膜的形成熔融石英进行了研究,展示了如何抑制岛的形成和减少等离子体吸收可以通过处理基板与(3-巯丙基)三甲氧基硅烷沉积前实现。实现了沉积厚度低至5.4nm的无空隙薄膜,并且在室温下保持结构稳定。通过镜面反射和漫反射X射线测量对薄膜进行了详细的结构分析,结果表明,连续超薄膜的光学透射特性可以用金的体介电函数来解释。然而,重要的是要考虑到金属和周围的过渡金属之间的非突变过渡区,其延伸通过横向连续的超薄膜(膜厚度低于10 nm)的几个晶格常数。与突变界面的情况相比,这导致光传输的显著降低。这些发现意味着当考虑连续超薄膜时,原子尺度界面结构起着重要作用,例如,作为半透明的电接触,因为光透射显著偏离理想膜的理论预测。

英文摘要:

Realizing laterally continuous ultra-thin gold films on transparent substrates is a challenge of significant technological importance. In the present work, formation of ultra-thin gold films on fused silica is studied, demonstrating how suppression of island formation and reduction of plasmonic absorption can be achieved by treating substrates with (3-mercaptopropyl) trimethoxysilane prior to deposition. Void-free fi lms with deposition thickness as low as 5.4 nm are realized and remain structurally stable at room temperature. Based on detailed structural analysis of the fi lms by specular and diffuse X-ray reflectivity measurements, it is shown that optical transmission properties of continuous ultra-thin films can be accounted for using the bulk dielectric function of gold. However, it is important to take into account the non-abrupt transition zone between the metal and the surrounding dielectrics, which extends through several lattice constants for the laterally continuous ultra-thin films (film thickness below 10 nm). This results in a significant reduction of optical transmission, as compared to the case of abrupt interfaces. These findings imply that the atomic-scale interface structure plays an important role when continuous ultra-thin films are considered, e.g., as semi-transparent electrical contacts, since optical transmission deviates significantly from the theoretical predictions for ideal films.

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