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arXiv 1409.4358cond-mat.mtrl-sci
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元素铋与铟、镓和锡的p型掺杂:一种新的固体掺杂机制

P-type doping of elemental bismuth with indium, gallium and tin: a novel doping mechanism in solids

Hyungyu Jin, Bartlomiej Wiendlocha, Joseph P. Heremans

摘要:

描述了一种新的掺杂机制,由此掺杂杂质不简单地将电荷转移到主体半导体或半金属的能带,而是重新排列主体的价带深处的芯能级。这又导致所有电子在主体中的重新分布,并且如果设计得当,则改变费米能级EF的位置和EF附近的导电载流子的密度。该原理在元素Bi中得到实验证明,其中III族元素In和Ga掺杂Bi p型,尽管所有三个原子在固态下都是三价的。电子结构的计算表明,超深缺陷态(HDS)的形成和它的影响,在Bi掺杂In(Bi:In)和Ga(Bi:Ga)的EF。在元素Bi的EF以下-5至-6 eV处的HDS与Bi 6p电子杂交,并且使Bi价带中每个杂质原子失去两个电子。然后,这扰乱了固体中的电子计数并降低了EF。杂质原子上的电荷不变。原则上,这种掺杂作用不会导致在常规掺杂中散射传导电子和空穴的电离杂质的出现。实验上,Shubnikov-de Haas和霍尔效应测量表明,向Bi中加入In导致空穴密度增加。给出了单晶和多晶样品的热电、电流磁和热磁数据。In掺杂导致热电优值的提高,这表明新的掺杂机制也为开发更好的热电材料提供了一条途径。相同的机制是在工作中的Sn掺杂的Bi(Bi:Sn),虽然在这里电离杂质散射是不可避免的。

英文摘要:

A new doping mechanism is described, whereby a doping impurity does not simply transfer charge to the bands of a host semiconductor or semimetal, but rearranges the core energy levels deep in the valence band of the host. This, in turn, leads to a redistribution of all electrons in the host, and, if designed properly, changes the location of the Fermi level EF and the density of conducting charge carriers near EF. The principle is proven experimentally in elemental Bi, whereby group III elements In and Ga dope Bi p-type, in spite of the fact that all three atoms are trivalent in the solid state. Electronic structure calculations show the formation of a hyperdeep defect state (HDS) and its effect on the EF in Bi doped with In (Bi:In) and Ga (Bi:Ga). The HDS at -5 to -6 eV below the EF of elemental Bi hybridizes with the Bi 6p electrons, and deprives the Bi valence band of two electrons per impurity atom. This then perturbs the electron count in the solid and lowers the EF. The charge on the impurity atoms is unchanged. In principle, this doping action does not result in the appearance of ionized impurities that scatter conduction electrons and holes in conventional doping. Experimentally, Shubnikov - de Haas and Hall Effect measurements show that adding In to Bi results in an increase in the density of holes. Thermoelectric, galvanomagnetic and thermomagnetic data are given for single-crystal and polycrystalline samples. In-doping leads to an enhancement of the thermoelectric figure of merit, which suggests that the new doping mechanism also gives a route to develop better thermoelectric materials. The same mechanism is at work for Sn-doped Bi (Bi:Sn), although here ionized impurity scattering is not avoided.

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