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arXiv 1403.0147cond-mat.mtrl-scicond-mat.mes-hall
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拓扑Bi(111)双层膜的边缘工程

The edge engineering of topological Bi(111) bilayer

Xiao Li, Hai-Wen Liu, Hua Jiang, Fa Wang, Ji Feng

摘要:

拓扑绝缘体是一种新型的量子态,其特征在于具有受量子保护的非平凡边缘/表面态。我们的第一性原理模拟显示了化学修饰对拓扑Bi(111)双层纳米结构边缘态的显著影响,去除了平凡的边缘态,恢复了拓扑边缘态的Dirac线性色散.通过比较有无化学修饰的边缘态,Bi(111)双层纳米结构提供了一个简单的系统来评估边缘态的电导波动。化学修饰还可以改变边态的穿透深度和自旋织构。提出了一个低能有效模型来解释Bi(111)双层纳米结构独特的自旋织构,它打破了沿扶手椅边缘的自旋-动量正交性。

英文摘要:

A topological insulator is a novel quantum state, characterized by symmetry-protected non-trivial edge/surface states. Our first-principle simulations show the significant effects of the chemical decoration on edge states of topological Bi(111) bilayer nanoribbon, which remove the trivial edge state and recover the Dirac linear dispersion of topological edge state. By comparing the edge states with and without chemical decoration, the Bi(111) bilayer nanoribbon offers a simple system for assessing conductance fluctuation of edge states. The chemical decoration can also modify the penetration depth and the spin texture of edge states. A low-energy effective model is proposed to explain the distinctive spin texture of Bi(111) bilayer nanoribbon, which breaks the spin-momentum orthogonality along the armchair edge.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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