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arXiv 1303.3111cond-mat.mtrl-sci
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晶体对称性与固液界面熔体生长动力学

Crystalline symmetry and the melt-growth kinetics of solid-liquid interface

Ching-Hao Wang, Kuo-An Wu

摘要:

控制材料生长形态的重要因素之一是界面动力学系数μ,它是固液界面速度与过冷度之间的比例常数。我们采用Ginzburg-Landau(GL)自由能泛函推导出动力学系数的解析表达式。动力学系数的各向异性自然产生于不同晶向的固-液界面对称性破缺。将动力学系数的解析表达式与从流体动力学方程导出的Mikheev-Schnev理论[J. Cryst. Growth 112,591(1991)]进行比较。此外,我们使用平衡密度波剖面来评估动力学系数,并将其与MD模拟结果进行比较。我们的研究结果是在良好的协议与Mikheev-Hesov理论和MD模拟和揭示的界面动力学的各向异性的可能起源。

英文摘要:

One of the important factors governing the growth morphology of materials is the interface kinetic coefficient μ, which is the proportionality constant between the velocity of solid-liquid interface and undercooling. We employ Ginzburg-Landau (GL) free energy functional to derive an analytical expression of kinetic coefficients. The anisotropy of kinetic coefficients naturally arise from the broken symmetry at the solid-liquid interface for various crystalline orientations. The analytical expression of kinetic coefficients is compared to Mikheev-Chernov theory [J. Cryst. Growth 112, 591 (1991)] derived from hydrodynamic equations. In addition, we use equilibrium density wave profiles to evaluate kinetic coefficients and compare them with that from MD simulations. Our results are in good agreement with Mikheev-Chernov theory and MD simulations and shed lights on a possible origin of anisotropy of interfacial kinetics.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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