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arXiv 1208.4601cond-mat.mes-hallcond-mat.dis-nncond-mat.mtrl-sci
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为什么拓扑绝缘体的体积电阻率这么小?

Why is the bulk resistivity of topological insulators so small?

Brian Skinner, Tianran Chen, B. I. Shklovskii

摘要:

原生拓扑绝缘体(TI)通常是重掺杂的$n$型晶体。受主的补偿被用来将费米能级移动到带隙的中间,但即使这样,TI也具有令人沮丧的小体积电阻率。我们表明,这个小电阻率是由于带弯曲的随机库仑电位差屏蔽波动。使用完全补偿的TI的数值模拟,我们发现,体电阻率的激活能只有0.15倍的带隙,与实验数据吻合良好。在较低的温度下,激活的运输交叉到可变范围跳跃具有相对较大的本地化长度。

英文摘要:

As-grown topological insulators (TIs) are typically heavily-doped $n$-type crystals. Compensation by acceptors is used to move the Fermi level to the middle of the band gap, but even then TIs have a frustratingly small bulk resistivity. We show that this small resistivity is the result of band bending by poorly screened fluctuations in the random Coulomb potential. Using numerical simulations of a completely compensated TI, we find that the bulk resistivity has an activation energy of just 0.15 times the band gap, in good agreement with experimental data. At lower temperatures activated transport crosses over to variable range hopping with a relatively large localization length.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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